Mask aligner
Status: | Standard operating procedures | Reservation is not required
Training prerequisites: General cleanroom training Training contact: Madina Zhelbuldina Technical contact: Arman Tuigynbek, Zhanibek Balgin
Karl Suss MA6 Gen 4 Mask Aligner
- Exposure source: 500W HgXe lamp
- Wavelength range: 220 (DUV) - 450 nm
- Contact modes: soft, hard, vacuum contact
- Exposure modes: constant power, constant dose
- Wedge Error Compensation (WEC)
- Substrate sizes: 2", 3", 4" wafers and small samples (5x5 mm)
- Max substrate thickness: 10 mm
- Mask size: 2" x 2" up to 5" x 5"
