LAB-18 Magnetron Sputtering System

Status: Standard operating procedures (under development) | Reserve the tool

Training prerequisites: General cleanroom training and material compatibility (see SOP)
Training contact: Arman Tuigynbek
Technical contact: Arman Tuigynbek, Zhanibek Balgin

KJLC Magnetron Sputtering System - LAB-18

  • Target size: 2” x 0.250” targets
  • Sources: 1 RF and 2 DC, shuttered magnetron guns
  • Thickness monitoring: QCM
  • Sample size: up to 4” diameter. Small samples can be attached with a vacuum compatible tape
  • Substrate rotation and tilting
  • List of currently available targets: Al, Cu, Si (undoped), Cr, Sn, Mo, W, Ti, Ag, ITO, TiN, TiO2, Hf, Zr, HfO2, ZrO2, ZnO, SnO
  • Available process gasses: Ar, N2, O2