Ultratech Fiji G2 Atomic Layer Deposition system

Status: Standard operating procedures (under development) | Reserve the tool

Training prerequisites: General cleanroom training and material compatibility (see SOP)
Training contact: Arman Tuigynbek
Technical contact: Arman Tuigynbek, Zhanibek Balgin

Ultratech Fiji G2 PEALD

  • Thermal and plasma deposition of thin films (max. 50 nm)
  • Sample size: 4” (up to 6”)
  • Inductively-coupled plasma (ICP) source for plasma-enhanced ALD (13.56 MHz generator, 600 Watt)
  • Max. table temp: 550C
  • Three jacket heated precursors (plus a separate H2O input)
  • Precursors available for: Al2O3, TiO2
  • Available gases: Ar, N2, ozone

The following processes are available:

  • TiO2
  • Al2O3